Effects of working pressure on structure and composition of TiAlN coating fabricated by co-sputtering deposition technique

  • Bùi Tiến Sơn
  • Nguyễn Quang Định
  • Uchiyama Kyoshi
  • Phạm Văn Hưng
  • Phạm Đức Cường

Abstract

TiN-based coatings have been used widely for protecting surface of various
application fields due to their superior properties such as high hardness, low friction coefficient, and low wear rate. Indeed, adding aluminium (Al) into the TiN coatings would further increase their hardness and oxidation resistance. Generally, TiAlN coatings are synthesized using alloy targets of specific percentages of Titan (Ti) and Al. However, for control of Ti/Al ratio in the coating composition, there exists another technique, namely co-sputtering, which could be used. This technique involves using a Ti and an Al target mounted separately on two guns of the sputtering system for the deposition process. In our work, TiAlN thin coatings were fabricated on silicon (Si) wafers using a magnetron co-sputtering technique under different pressures. Chemical composition of the coatings was studied by the Energy Dispersive Spectroscopy

(EDS), whereas morphology of the coating was observed by Field Emission Scanning Electron Microscope (FESEM). The experimental results showed that TiAlN coating was well formed on Si wafers and the deposition pressure strongly affected composition and morphology as well as the Ti/Al ratio of the coating

điểm /   đánh giá
Published
2019-07-13