Nitrogen doped titanium dioxide films mechanism prepared by reactive DC magnetron

Abstract

Studying about TiO_2-xN_x thin films fabricated by unbalanced DC reactive magnetron sputtring  has showed that photocatalytic effects can be appeared under visible light. The characteristic films were tested by X-ray diffraction, UV-vis spectroscopy.  Nitrogen concentration thin films were examinated by EDX methods. The photocatalytic properties of thin films were represented by Methylene Blue MB degradation (C₁₆H₁₈ClN₃S.3H₂O = 373,5). The results showed that the band gap increase when N₂ conentration increase because of bonding with obital 2p in  TiO_2-xN_x thin films.The studies also present a new mechanism on the Nitrogen doped in the anatase TiO₂ to fabricate TiO2-xNx thin films, that is perfectly different from the doped mechanism before [1,8]. Moreover, the best thin films were fabricated with such parameters: sputtering pressure 13mtorr, power 240W, film thickness from 600nm to 700nm and gas ratio N₂/O₂ = 4 -5,5.