Studying optimal parameters of TiO2 and SiO2 thin films to prepare for anti-reflection coating

Abstract

TiO2 thin film was fabricated by dc sputtering, SiO2 was made by rf sputtering with various ratio of O2 / Ar+O2 = 30%, 15%, 12% and 6%. The optical characteristics of films were determined by transmittance spectra UV-Vis. The structure and roughness surface Rms were investigated by AFM method. The ratio of O2 of 6% is the best condition to prepare for anti-reflection coating (AR) – double layers. It can increase about 4.5 % the transmittance if comparing with bare substrate.